optical photolithography
常见例句
- At the present time, micro optical elements with continuous relief structure are usually fabricated by the multi-mask photolithography.
目前一般采用多个二元掩模多次套刻的方法来制作连续微浮雕结构，用量化的台阶去逼近理想的轮廓。 - It goes with the tide of miniaturizing and integrating in optical devices. It has wide prospects for application in photolithography, fiber communication and optical information processing etc.
它顺应了光学元件微小化和阵列化的趋势，在光刻、光纤通信、光学信息处理等领域有着广阔的应用前景。 返回 optical photolithography