nanolithography

基本解释

The projection electron beam lithography with angular limitation(PEBL)is potentially one of the most attractive techniques for nano lithography in the21st Century.
具有角度限制的電子束投影曝光技術有可能成爲21世紀最有潛力的納米光刻技術之一。
Nano lithography technology plays a very important role in the field of nano electronic manufacturing, while e beam lithography is one of the best ways to produce nano features.
納米光刻技術在微電子制作中起著關鍵作用，而電子束光刻在納米光刻技術制作中是最好的方法之一。
These techniques include molecular assembly, arrangement of nano particles, scanning force microscopy fabrication and nano lithography based on photon beam, electron beam, and ion beam.
結果對基於分子組裝與納米光刻的納料制造技術給予很大的重眡。

Chou can use his Nano-Imprint Lithography technique for semiconductor markets to make designs and chips.
FORBES: Adviser Soapbox